美國薩凡納藝術(shù)與設(shè)計學(xué)院服裝留學(xué)要求，相信這個問題是許多正在準備留學(xué)的同學(xué)關(guān)心的一個問題，那么下面小編就來和大家說一說，感興趣的您趕緊往下了解吧。
一、院校介紹
SCAD是全美最大的藝術(shù)學(xué)院，也是全球最大的專門藝術(shù)大學(xué)之一。位于佐治亞州有著200多年的歷史古城薩凡納市。由于整個城市的古建筑保存完好，這里被人們稱為美國最美麗的城市之一。學(xué)院建筑系的教學(xué)樓是一座建于1887年的古屋，而整個城市更像是一座活生生的建筑博物館，有著百年歷史的建筑隨處可見，現(xiàn)在仍舊有人居住和使用。
院校排名：薩凡納藝術(shù)與設(shè)計學(xué)院在2019QS世界大學(xué)專業(yè)排名(藝術(shù)&設(shè)計)中，名列世界第47，美國第16。
School of Design設(shè)計學(xué)院：
設(shè)計學(xué)院下面設(shè)有以下幾個系：可持續(xù)設(shè)計(Design for sustainability)MA，設(shè)計管理(Design management)MA、MFA，纖維(Fibers)，工業(yè)設(shè)計(Industrial design)BFA / MA、MFA，珠寶設(shè)計系(Jewelry and objects)BFA / MA、MFA，服務(wù)設(shè)計(Service design)BFA / MFA。這些專業(yè)都是在薩凡納校區(qū)上課。
二、服裝設(shè)計申請要求
申請專業(yè)
M.F.A. in fashion 90學(xué)時
作品集要求
Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.
托福/雅思要求：
SCADs TOEFL institution code is 5631.
申請專業(yè)
M.A. in fashion 45學(xué)時
作品集要求
Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.
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